Laser-driven plasmas serve as the light source in new-generation extreme ultraviolet (EUV) nanolithography machines. These intense, EUV-emitting plasmas are generated when tin droplet targets are irradiated with high-intensity laser pulses. The goal of this PhD project is to identify and investigate the fundamental physical processes responsible for plasma formation and EUV generation from complex targets for future nanolithography applications. Using a combination of theoretical and numerical techniques, the candidate will develop models to guide the development of future plasma-based EUV radiation sources. The position will involve close collaboration with fellow members of the Plasma Theory & Modeling group at ARCNL as well as with experimentalists in the EUV Plasma Processes group and researchers at our industrial partner ASML.
The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands, and is finalizing its buildup towards a size of approximately 100 scientists and support staff. See also www.arcnl.nl
The research activities of the Plasma Theory and Modeling group at ARCNL are focused on the theoretical and numerical modelling of laser-driven plasma sources of EUV light for nanolithography. Research performed by the group covers topics in non-LTE atomic kinetics & spectral modelling, plasma expansion dynamics as well as tin droplet propulsion and deformation upon laser impact.
You have an MSc in physics. Knowledge in the fields of theoretical/computational atomic, plasma or fluid physics is advantageous but not a prerequisite. Good verbal and written communication skills (in English) are required.
The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of 1 year, with the intention of an extension of three years. After successful completion of the PhD research a PhD degree will be granted by the Vrije Universiteit Amsterdam (VU). Several courses are offered, specially developed for PhD-students. ARCNL assists any new foreign PhD-student with visa applications and compensates their transport costs and furnishing expenses.
Dr. John Sheil and Dr. Oscar Versolato
Group leaders Plasma Theory & Modeling/EUV Plasma Processes
Phone: +31 (0)20-851 7100
Please send your:
- Motivation on why you want to join the group (max. 1 page).
Applications without this motivation will not be taken into consideration. However, with this motivation your application will receive our full attention.
Online screening may be part of the selection.
Commercial response to this ad is not appreciated.
|Titel||PhD-student: Modeling laser-driven plasma sources of EUV light for next-generation nanolithography|
|Employer||Advanced Research Center for Nanolithography ARCNL|
|Job location||Science Park 106, 1098 XG Amsterdam|
|Gepubliceerd||augustus 25, 2021|
|Sluitingsdatum||november 26, 2021|
|Vakgebieden||Geluidsleer (Akoestiek),   Electromagnetisme,   Optica,   Thermodynamica,   Experimentele fysica,   Geofysica,   Biofysica,   Atomaire, moleculaire en optische fysica,   Computationele fysica,    and 20 more. Gecondenseerde materiefysica,   Cryogenics,   Vloeistofdynamica,   Materiaalfysica,   Mathematische fysica,   Medische fysica,   Moleculaire fysica,   Nucleaire fysica,   Deeltjesfysica,   Plasmafysica,   Quantumfysica,   Solid-state Physics,   Theoretische fysica,   Voertuigdynamica,   Versnellerfysica,   Toegepaste fysica,   Vloeistofmechanica,   Scheikundige Natuurkunde,   Laserfysica,   Fotonica  |