Your future responsibilities
The main goal of the project is to investigate the influence of plasma discharge parameters in inductively coupled conditions on etch performance and quality of LiNbO3 based PIC structures. Simulation and modeling methods will be implemented to simulate the plasma process and to predict the etch trends and results. In addition, this project also includes etch mask selection and test structure design and test vehicle characterization. The final goal is the minimization of optical losses while simultaneously reducing PIC device footprint. In particular, the developed LNOI etching process should demonstrate:
1. Control of etch depth and width (CD), i.e., profile angle controls insertion loss.
2. Smooth sidewalls, that help minimize propagation losses.
3. Vertical sidewalls, that enable tighter bend radius and smaller footprint.
4. Up-scaling of the process to 200 mm wafers.
The etch process performance will be characterized by various available techniques including XPS, AFM, and SEM. The optical losses will also serve as an important figure of merit for fabricated PIC test structures.
The research will involve:
-
Working in the ISO5 clean room environment
-
Performing experimental work on Plasma etching equipment
-
Performing characterization
-
Design of experiments
-
Participation in plasma process simulation and modeling
-
Writing reports and scientific papers
-
Conference participation
Your profile
-
Master's degree in physics, chemistry, micro/nanotechnology or related fields.
-
Advanced knowledge in plasma physics/chemistry.
-
Previous experience in plasma etch/CVD and micro/nano fabrication.
-
Basic knowledge of plasma diagnostics tools (OES, RFEA).
-
Characterization skills in at least two of the listed instruments: SEM, AFM, ellipsometry, profilometry.
-
Knowledge of surface characterization techniques are required, and knowledge of III-N materials is an advantage.
-
Excellent written and oral communication skills in English.
-
Enthusiasm for independent developing of new ideas and a positive attitude towards new challenges.
-
Optional: knowledge of COMSOL plasma module; CFD-ACE+.
Important Facts about SAL
-
Application deadline: 3 November 2024
-
Weekly working hours: 38.5
-
Diversified research activities with plenty of technical challenges.
-
State-of-the-art lab facilities and instruments.
-
Internal and external training opportunities for further development.
-
Home Office possible.
-
€ 4 per day food allowance in restaurants or € 2 per day in supermarkets.
-
Family & kids friendly.
-
Free coffee/milk/tea & fresh fruits.
For this position you will receive a monthly gross salary of EUR 3,827, which will be paid 14 times a year. Financial support for housing for stays abroad (e.g., in case of secondments) and travelling expenses will be offered on a case-by-case basis.
Become part of Silicon Austria Labs
Application requirements:
-
Applicants must not have resided and/or carried out their main activity (work, studies, etc.) in Austria for more than 12 months in the 3 years immediately before the call deadline.
-
Master's degree including official evidence completed by application deadline.
-
Not in possession of a PhD degree.
-
Only complete sets of application documents concatenated in a single PDF can be accepted.
Required application documents (concatenated in a single PDF in this order):
-
[Mandatory] 1-page letter of motivation (in English), including a declaration of the considered research topic
-
[Mandatory] CV (in English), including
-
expertise, skills, and
-
(if applicable) list of internships and publications & patents
-
[Mandatory] Scanned copies of transcripts of records for bachelor and the master (or equivalent degree) including the diplomas proofing the completion of the studies (originally issued in English or German, or an official translation in alignment with the guidelines on translation and authentication)
-
[Mandatory] Proof of fluency in English at minimum B2 level (Upper Intermediate English). Accepted proofs are e.g. master studies in English or an internationally accepted certificate.
-
[Mandatory] Scanned copy of valid Passport/ID
-
[Optional] Letter of references from academic reference persons (with contact details)
-
[Optional] Authored/Co-authored publications
-
[Mandatory] Master thesis
Please check all the details about the application requirements on our website: Crystalline Program Recruitment | SAL Research Network (silicon-austria.com)